Novel molecules for euv lithography: a new approach to photoresist design, coupled with fractal description and molecular simulation or roughness

 

ΤΙΤΛΟΣ  ΕΡΓΟΥ Novel molecules for euv lithography: a new approach to photoresist design, coupled with fractal description and molecular simulation or roughness
ΕΠΙΣΤΗΜΟΝΙΚΟΣ ΥΠΕΥΘΥΝΟΣ  
ΠΙΤΣΙΝΟΣ  ΕΜΜΑΝΟΥΗΛ
ΗΜ. ΕΝΑΡΞΗΣ 1/5/2003
ΗΜ. ΛΗΞΗΣ 30/4/2012
ΦΟΡΕΑΣ  ΧΡΗΜΑΤΟΔΟΤΗΣΗΣ INTEL/ ΕΚΕΦΕ "Δημόκριτος" –I.ΜΙΚΡΟΗΛΕΚΤΡΟΝΙΚΗΣ